Low-cost direct writing lithography system for the sub-micron range
نویسندگان
چکیده
We have developed a fixed beam direct writing laser lithography system with a resolution of 400 nm at 457 nm wavelength and a writing speed of 4.2 mm/s with total system costs of less than 100 000 US$. Keyword: Laser lithography system
منابع مشابه
Laser scanner for direct writing lithography.
A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 microm are presented.
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